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Dongguan Huicheng Vacuum Technology Co., Ltd.

Multi-Arc Ion Vacuum Coating Machine, Multi-Arc Ion Metallizing Machine, Multi-Arc Ion Vacuum Coater manufacturer / supplier in China, offering Multi-Arc Ion Vacuum Coating Machine, Hcvac Titanium Nitride PVD Vacuum Coating Machine, Chrome Vacuum Coating Machine, Chrome PVD Plating Machine and so on.

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Supplier Homepage Product Multi-function ion coating machine Multi-Arc Ion Vacuum Coating Machine

Multi-Arc Ion Vacuum Coating Machine

FOB Price: Get Latest Price
Min. Order: 1 Set
Production Capacity: 200 Sets /Year
Transport Package: 40 Gp Container/Set
Payment Terms: L/C, T/T

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Basic Info
  • Model NO.: LH-
  • Coating: Vacuum Coating
  • Size: 1600*1800mm
  • Specification: 8
  • HS Code: 8543300090
  • Type: Coating Production Line
  • Substrate: Glass, Metal, Ceramic, Alloy, Crystal, Mosaic
  • Trademark: HUICHENG
  • Origin: Guangdong Dongguan, China
Product Description
Multi-Arc Ion Vacuum Coating Machine integrated three technology of DC magnetron sputtering, middle frequency sputtering and electric arc ion evaporation, combining the linear ionize source and pulse bias coating to thin the deposition particles. The various film performance are improved, and be able to coat alloy film, compound film, multilayer composite film on the surface of metal as well as nonmetal. After years of dedicated R&D by our engineer, through unique cathode electric arc ion and unbalanced magnetron systems, we develop a package of PROPOWER series of computer automatic control system. It makes the coating film adhesion density as well as good complex consistency, and solve the problems of the complexity of the manual operation, film color inconsistencies, etc.

Characteristic:

1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.

2. The performance of electric arc plasma evaporation source is reliable, be able to work under the current 30A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition.
Mode Dimension LH-800 LH-1100 LH-1250 LH-1600 LH-1800
800*1000mm 1100*1000mm 1250*1500mm 1600*1800mm 1800*2000mm
Maily application Metal  decorative coating and Ceramic decorative coating
Coating mode and main confirguration Eight multi-arc targets Ten multi-arc targets Twelve multi-arc targets Twenty multi-arc targets Twenty two multi-arc targets
Power source Electric-arc power, Filament power,   Pulsed bias power supply
Process gas control Mass flowmeter + Electromagnetic ceramic valve
Vacuum chamber structure Vertical side opening door, pump system postposition, double water cooling  
Vacuum system Molecule pump +Roots pump +Mechanical pump(8.0*10 -5 Pa) Diffusion pump +Roots pump +Mechanical pump(8.0*10 -4 Pa)
Workpiece baking temperature   Normal temperature to 350 centi-degree PID control, radiation heating.
Workpiece motion mode Public rotation Frequency control: 0-20 rotation per minute
Measure mode Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa
Control mode Manual/Automatic/PC/PLC + HMI/PC four choice of control mode
Remark We can design the dimension of the equipment according to customer’s special technique requirement.
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