Gold Member Since 2009
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Dongguan Huicheng Vacuum Technology Co., Ltd.

Jewelry and Watchband PVD Ion Plating Machine, PVD Ion Plating Machine for Jewelry, PVD Coating Machine for Watchband manufacturer / supplier in China, offering Jewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry/PVD Coating Machine, Ceramic Tiles Decoration Titanium Gold PVD Coating Machine, Jewelry Ion Plating Machine for Gold, Rose Gold, Black, Blue Color and so on.

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Supplier Homepage Product Multi-function ion coating machine Jewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry/PVD Coating Machine

Jewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry/PVD Coating Machine

FOB Price: Get Latest Price
Min. Order: 1 Piece
Production Capacity: 200 Set/Sets Per Year
Transport Package: Wooden Package
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram

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Basic Info
  • Model NO.: JTL-series
  • Coating: Vacuum Coating
  • Certification: ISO90002
  • Year After-Sales Service Provided: Engineers Available to Service Machinery Overseas
  • Dimension: D1100mm*H1000mm .
  • Origin: China
  • Type: Coating Production Line
  • Substrate: Steel
  • Condition: New
  • Warranty: 1 Year
  • Trademark: HUICHENG
  • HS Code: 8543300090
Product Description
Jewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry

Specifications

Gold plating machine is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, jewelry

Gold plating machine integrated three technology of DC magnetron sputtering, middle frequency sputtering and electric arc ion evaporation, combining the linear ionize source and pulse bias coating to thin the deposition particles. The various film performance are improved, and be able to coat alloy film, compound film, multilayer composite film on the surface of metal as well as nonmetal. After years of dedicated R&D by our engineer, through unique cathode electric arc ion and unbalanced magnetron systems, we develop a package of PROPOWER series of computer automatic control system. It makes the coating film adhesion density as well as good complex consistency, and solve the problems of the complexity of the manual operation, film color inconsistencies, etc.

For more information,pls contact with : Sophia 

Mobile/Line:86 13600282018  
 

Characteristic:
1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.
2. The performance of electric arc plasma evaporation source is reliable, be able to work under the current 30A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition.
Applied industry: The equipment is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, hardware, sanitary ware, cutters, anti-friction tools, dies and mould, etc. It can coat TiN, TiCN, CrN, TiALN, TiNbu, TiCrN, ZrN, and various kinds of diamonds film (DLC).

Jewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry/PVD Coating Machine
Jewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry/PVD Coating MachineJewelry and Watchband PVD Ion Plating Machine/PVD Ion Plating Machine for Jewelry/PVD Coating Machine

Mode

Dimension
 

JTL-900
 

JTL-1100
 

JTL-1250
 

900*1000mm
 

1100*1000mm
 

1250*1100mm
 

 

Coating mode and main confirguration
 

Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets 
 

 

Six multi-arc targets + a pair of twin (MF)magnetron sputtering targets
 

Twelve multi-arc targets + two sets of  plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets
 

Power source 
 

Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.
 

Process gas control
 

Quality flowmeter + electromagnetism ceramic valve
 

Vacuum chamber structure
 

Vertical single(side) door, pump system postposition, double water-cooling
 

Vacuum system
 

Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa)

Diffusion pump +Roots pump +Mechanical pump(5.0*10 -4 Pa)
 

Workpiece baking temperature
 

 

Normal temperature to 350 centi-degree PID control, radiation heating.
 

Workpiece motion mode
 

Public rotation Frequency control: 0-20 rotation per minute
 

Measure mode
 

Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa
 

Control mode
 

Manual/Automatic/PC/PLC + HMI/PC  four choice of control mode
 

Remark
 

We can design the dimension of the equipment according to customer's 
 

For more information,pls contact with : Sophia 

Mobile/Line:86 13600282018  

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