Magnetron sputtering PVD vacuum coating machine
What is magnetron sputtering technology?
Magnetron sputtering is another form of PVD coating technology.
Magnetron sputtering technology is characterized by:
A water-cooled target, so little radiation heat is generated
Almost any metallic target material can be sputtered without decomposition
Non-conductive materials can be sputtered by using radio frequency (RF)
Or medium frequency (MF) power
Oxide coatings can be sputtered (reactive sputtering)
Excellent layer uniformity
Very smooth sputtered coatings (no droplets)
Cathodes (of up to 2 meter long) can be put in any position, therefore high
Flexibility of sputtering equipment design
Huicheng manufactures and supplies all kinds of PVD vacuum coating machines. Now it is a market leader in the high-vacuum treatment field with customers from all around the world. Huicheng produces a complete range of machinery, offering different types of processes: High vacuum evaporation, multi-arc, DC sputtering, MF magnetron sputtering, continuous magnetron sputtering line etc.
Surface vacuum coating for watch&clock, jewelries, tools, plastic, stainless steel sheet etc.
The coating experts of your own company:Full set solution for the coating production
HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most suitable technology according to your requirements.
We will make the special coating solution for each customer; combine the full set production technics to meet your requirements, to ensure high efficiency of production.
We developed a complete after-sales system and effective service measures. Company now owns a professional after-sales service team with more than ten experienced engineers.
ISO 9001 standard to ensure the quality can meet the customer's requirements.
Please feel free to contact us for further information!
|Φ9001000mm||Φ11001000mm||Φ13001200 mm||Φ16001200 mm|
Coating mode and main confirguration
|3 electric-arc+2 pairs of plane rectangular cathode||6 electric-arc+2 pairs of cylindrical cathode||5 electric-arc+4 pairs of cylindrical cathode||6 electric-arc+8 pairs of cylindrical cathode|
|Film Types ||Metal films,Dielectric films,Compound films,Reaction films,Muti-layer function films|
|Power source||Electric arc power supply,DC magnetron power supply,MF magnetron power supply.Pulse bias voltage power supply.ion source power supply.|
|Process gas control||Quality flowmeter + electromagnetism ceramic valve|
|Vacuum chamber structure||Vertical single(side) door, pump system postposition, double water-cooling|
|Vacuum system||Molecule pump(diffusion pump)+Roots pump +Mechanical pump (8.0*10-4Pa)|
|Pumping speed||Pumping time less than 15 minutes ,from atmospheric pressure to 310 -3 Pa|
|Workpiece motion mode||Public rotation Frequency control: 0-20 rotation per minute|
|Measure mode||Number display composite vacuum gauge: from atmosphere to 1.0*10-5Pa|
|Control mode||Full automation control system PC+PLC/PC+HMI|
|Remark||We can design the dimension of the equipment according to customers special technique requirement.|