| After-sales Service: | Technical Go Overseas Install Machine |
|---|---|
| Warranty: | One Year |
| Type: | Coating Production Line |
| Coating: | Vacuum Coating |
| Substrate: | Ceramic |
| Certification: | CE, ISO |
| Customization: |
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Audited Supplier LOAD-LOCK TYPE SPUTTERING SYSTEMCOMPACT MULTIFUNCTIONAL SPUTTERING COATING MACHINE
Load-lock type Sputtering System Characteristic:
Redesign ease of use by leveraging traditional process data and proprietary technology
Increase productivity by installing a box mechanism (optional) in the load locking chamber
Support multi cathode stacking / simultaneous sputtering
The labor-saving operation is realized through the automatic processing of touch panel and formula input
Data recording is possible
Widely used in the research and development and production of electronic components, plating metal films or resistive films on ceramics, glass and metals. Realize deep hole coating
Features:
1. Ten base material trays greatly improve the production capacity.
2, modular design, shorten the production cycle
3. Keep the vacuum state in the process room and never give up.
4, deep hole full coverage coating, depth ratio of 10:1.
5, the coating has good adhesion
| Main modules | |
| Arc | HiPIMS |
| The innovative APA evaporator technology (Advanced Plasma Assisted) is based on cathodic vacuum arc and offers diverse development possibilities for new layer architectures. Benefits: High target utilisation result in low target costs High deposition rates Adjustable magnetic fields Short target changing times High plasma density Reduction of macro-particles Excellent coating adhesion |
HiPIMS stands for High-Power Impulse Magnetron Sputtering. Benefits: High ionisation rate (similar to arc) High power densities from 100 to 1000 W/cm2 Very high plasma density Layer structures adjustable by plasma parameter settings Very smooth coatings Excellent coating adhesion Deposition of dense coatings at low substrate temperatures |
| Additional modules | |
| Sputter | Nitriding |
| In the sputtering process, atoms are extracted from a target by bombardment with high-energy ions (Ar) and transformed into the gas phase. By combining the sputtered material with additional gases, a coating is deposited on the substrate. Benefits: A wide range of materials can be sputtered Diverse process variants available Smooth coatings Good coating adhesion on combination with power etching prozess AEGD |
With the nitriding module, a plasma nitriding process can be performed before a PVD and/or PACVD coating process in one system and one batch. Thereby a hardened layer can be produced which offers excellent support for the subsequent PVD/PACVD coating. Benefits: Optimisation of tool and component properties Substitution of expensive base materials Significantly longer lifetimes All PVD coatings can be applied |
| DLC | ta-C |
| DLC stands for Diamond-Like Carbon and refers to a group of extremely low friction amorphous carbon coatings. With the DLC module, different DLC coatings can be produced by using PVD and/or PACVD processes. Standard DLC coatings consist of metal free or metal containing carbon coatings. Benefits: Excellent coating adhesion High wear resistance Low coefficient of friction Smooth coatings |
ta-C stands for tetrahedral amorphous carbon without hydrogen and refers to a group of extremely hard and low friction amorphous carbon coatings. With the ta-C module different ta-C coatings can be produced. Benefits: For higher temperature environments than DLC Very high wear resistance Excellent coating adhesion Smooth coatings |
| Model | HCSH-400 | HCSH-650 | HCSH-900 | HCSH-1200 | HCML-520 |
| Effective area | Ф400x H450mm | Ф650x H750mm | Ф900x H1200mm | Ф1200x H1500mm | W320 |
| Max working temperature | 550ºC | 350ºC | |||
| Substrate holder | 4 x Ф140 | 8 x Ф220 | 12 x Ф220 | 18 x Ф200 | 10 trays / batch |
| Loading capacity | 200KG | 500KG | Customization | ||
| Technology | PMA II , EFC , AEG, RF, HiPIMS | MS, RF, DC,HiPIMS | |||
| Pretreatment | Plasma cleaning | ||||
| Application | Scientific research , semiconductor, tools,moulds,parts and components,medical devices,optical,new energy and other industries | ||||
| Custom coating | Tool coating, mould coating , parts coating, DLC coating, GLC coating, ta-C coating,etc. | ||||
| Ultimate vacuum | Ultimate vacuum: ≤5 x10-4 Pa Work vacuum:≤5 x10-3 Pa |
8.0×10-5 Pa | |||
Electrode film forming / multilayer electrode and simultaneous film forming applications
Dielectric film forming, insulating film, passivation, protective film, etc.
Used for R & D and small-scale production of electronic components
Widely used in the research and development and production of electronic components, plating metal films or resistive films on ceramics, glass and metals. Realize deep hole coating
Machine Category:
Workshop:
Why Choose HCVAC System!
· Over 3000 plants installed worldwide
· Quick cycle times
· High production capability with low energy consumption
· More up time due to ease of loading/unloading and low maintenance
· High productivity with only a single operator
· Steel process chambers, built to last
· Eco-friendly
· Space saving design
· PVD option available on all plants
· 1 year component warranty and 25 years minimum guaranteed working life
· Complete global network of consulting, engineering and renowned after sales service
We developed a complete after-sales system and effective service measures. Company now owns a professional after-sales service
team with more than ten experienced engineers.
HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most
suitable technology according to your requirements.
We will make the full set special coating solution for each customer; combine the full set production technics to meet your
requirements, to ensure high efficiency of production.
ISO 9001 standard to ensure the quality can meet the customer's requirements.
Pls feel free contact with us!
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