| Customization: | Available |
|---|---|
| After-sales Service: | Free Installing and Training, Technical Support |
| Warranty: | One Year Limited Warranty |
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Roll to roll PVD vacuum coating machine for flexible electronics, touch panel, semiconductor
HCFLC series winding coating equipment provides a very competitive and cost-effective film coating technology for a variety of flexible and wearable electronic products, sensors, RFID tags, intelligent glass, intelligent packaging, etc. The application of high quality and low resistivity copper or TCO layers and structures has successfully closed the gap between productivity and versatility while meeting today's and future market demand.
This also makes the machine the first choice for applications such as ITO film, FPCB, Low-E or smart glass. The rotatable magnetron, with a maximum coating width of 2000 mm and a possible substrate roll diameter of 500 mm, is the basis for high productivity. In addition, optional gas separation between adjacent process sections allows deposition of a wide variety of metal and dielectric layers in one process.
In addition to being able to operate the reactive sputtering process at the same time as the non reactive sputtering process, the hcflc series can also be equipped with various in-situ sensors to continuously and accurately monitor the required physical layer characteristics, such as layer resistivity, reflectivity or transmittance.
Applications:
Touch panel and optical coating:
Applied for the glass and flexible substrate used for display, touch panel, optical coating and OGS key parts and process.
Satisfy the requirements of the cell phone, tablet, laptop and large-area TV.
Anti-reflection (AR coating): 2AR, 4AR, 6AR
Index matching+ITO(IMITO)
SiO2+ITO film
Mo/Al/Mo film
ITO film
Solar Cell
Delivered 3GW a-si PVD
CIGS: Mo, CuGa, In, AZO, ZnO
a-Si/u-Si: Al, ZO,Ag, NiCr
HIT: ITO,Ag, Cu
Gereral Specification
Chamber material: stainless steel (SUS304)
Main pump: Dry pump or rotary pump, Turbo molecular pump (TMP), Cryogenic pump, Diffusion pump etc.
Ultimate pressure: less than 1.07*10-4 Pa/24h@Empty, cleaning
Leak rate: less than 1.33*10-7 Pa, L/sec with He leakage detector
Winding speed:0.01~6.00m/min
Target: Metal: Al, Cr, Ni, Mo, Au etc.
Oxide: ITO, SiO2, TiO2, etc.
Substrate:Film (PET, PI, PC), Metal strip, flexible glass, plastic, texitile etc.
Adhesion: 100% (tape test)
Thickness uniformity less than +-5% in effective area
Control system: HMI control (PLC+PC base), selection function (manual/auto/semi auto), data feedback & real time display function.
Company Introduction:
The coating experts of your own company:Full set solution for the coating production
HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most suitable technology according to your requirements.
We will make the special coating solution for each customer; combine the full set production technics to meet your requirements, to ensure high efficiency of production.
Easy to implement
To many people unfamiliar with the process, PVD coating technology seems complicated. However, with the right investments and a good support, it is easier than expected. HCVAC has developed a turnkey coating process that makes a PVD coating centre easy to implement. A complete coating process consists of several steps: stripping (depending on the part's history); pre-treatment; quality control; cleaning & drying; fixturing & visual inspection; PVD coating; quality control & thickness measurement and post-treatment (depending on the application). These steps are all available from one partner: HCVAC Technology, including mature technics and coatings.
We developed a complete after-sales system and effective service measures. Company now owns a professional after-sales service team with more than ten experienced engineers.
ISO 9001 standard to ensure the quality can meet the customer's requirements.
Please feel free to contact us for further information!
Contact: Lillian Yang
Mobile: 0086-13825720037
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