Plastic tableware spoon fork plate gold,silver pvd vacuum coating machine
1. Vacuum process;
3. Get metallized and colorful film
4. Full automatic
Structure:plastic spoon pvd coating machine Its double doors structure enables the highly efficiency of substrates feeding-discharge and coating simultaneously.
plastic spoon pvd coating machine integrated with the resistance heating and DC magnetron sputtering coating technology in the vacuum chamber. It adopts magnetron sputtering cathode glow discharge technique to spill atoms from the targets, then some of atoms ionized and deposited on substrates, while it can be used to get vaporized film by resistance heating material in vacuum chamber, then increased the application and flexibility of equipment.
Characteristic: Reasonable Structure, quick Pumping speed, short work efficiency and easy operation, low energy consumption and performance advantages of stability.
plastic spoon pvd coating machine is equipped with plasma system, high efficiency magnetron sputtering cathode and resistance evaporation systems. It has features of high deposition rate, strong adhesion, smooth and shinning coating, good uniformity etc. Machine can be full automatic control, large loading capacity, reliable running, high qualified, low cost and environment protective.
Applied industry: It is mainly applied to plastic tableware, computer shell, mobile shell, household appliances etc. Industries, it can deposit metal film, alloy film, composite film, transparent (translucent) film, non-conductive film and electromagnetic shielding film.
Electroplating effects: General electroplating-face, dumb-(semi-mute, all dumb), the electroplating process wrinkles, wiredrawing, raindrop ect.Machine pic:Sample coated by the machine:More information about our vacuum coating machine, pls do not hesitate to contact:
Contact person: Mandy Liu
|Application||plastic decorative coating and glass decorative coating|
|Film type||Meal film, translucent film, nonconductive film, electromagnetism shield film, dielectric film, etc.|
|Power source||Resistance evaporation power, DC magnetron power, RF power|
|Sputtering and electrode structure||Column magnetron targets, plane rectangle targets, twin targets, evaporation electrode.|
|Vacuum chamber structure||Vertical double door, Vertical single door, pump system postposition, horizontal single door, pump system for side.|
|Ultimate vacuum||8.0*10 -4 pa|
|Vacuum system||Diffusion pump +Roots pump +Mechanical pump +Holding pump|
|Pump time||Pump from atmosphere to 8.5*10 -3 , 15 minutes|
|Workpiece motion mode||Public rotation/ Frequency control|
|Control mode||Manual/Automatic all in one mode, Touch screen + PLC|
|Remark||We can design the dimension of the equipment according to customer's special technique requirement.|