Customization: | Available |
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After-sales Service: | Technical Support, Free Installing and Training |
Warranty: | One Year |
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Characteristic:
1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.Mode Dimension |
JTL-800 |
JTL-1100 |
JTL-1250 |
800*1000mm |
1100*1000mm |
1250*1100mm |
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Coating mode and main confirguration |
Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets |
Eight multi-arc targets + a pair of twin (MF)magnetron sputtering targets |
Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets |
Power source | Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source. | ||
Process gas control | Quality flowmeter + electromagnetism ceramic valve | ||
Vacuum chamber structure | Vertical single(side) door, pump system postposition, double water-cooling | ||
Vacuum system | Molecule pump +Roots pump +Mechanical pump(5.0*10 -5 Pa) Diffusion pump +Roots pump +Mechanical pump(5.0*10 -4 Pa) |
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Workpiece baking temperature | Normal temperature to 350 centi-degree PID control, radiation heating. |
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Workpiece motion mode | Public rotation Frequency control: 0-20 rotation per minute | ||
Measure mode | Number display composite vacuum gauge: from atmosphere to 1.0*10 -5 Pa | ||
Control mode | Manual/Automatic/PC/PLC + HMI/PC four choice of control mode | ||
Remark |
We can design the dimension of the equipment according to customer ' s special technique requirement. |